Optimization of Post-Annealing Treatment Conditions on GaN Layer Grown on m-Plane Sapphire Substrate by Electron Beam Evaporator
This paper describes the effect of using different conditions of post-annealing treatment on properties of GaN layer grown on m-plane sapphire by electron beam (e-beam) evaporator. Prior to the annealing, the surface of the grown GaN was found to be smooth with some agglomerations of its grains i...
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主要な著者: | , , , |
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フォーマット: | Conference or Workshop Item |
言語: | English |
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2015
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オンライン・アクセス: | http://eprints.usm.my/48772/1/Section%20C%20164.pdf%20cut.pdf http://eprints.usm.my/48772/ |
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