Optimization of Post-Annealing Treatment Conditions on GaN Layer Grown on m-Plane Sapphire Substrate by Electron Beam Evaporator

This paper describes the effect of using different conditions of post-annealing treatment on properties of GaN layer grown on m-plane sapphire by electron beam (e-beam) evaporator. Prior to the annealing, the surface of the grown GaN was found to be smooth with some agglomerations of its grains i...

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書誌詳細
主要な著者: Ariff, A., Zainal,, N., Hassan,, Z., Ibrahim, K.
フォーマット: Conference or Workshop Item
言語:English
出版事項: 2015
主題:
オンライン・アクセス:http://eprints.usm.my/48772/1/Section%20C%20164.pdf%20cut.pdf
http://eprints.usm.my/48772/
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