Modelling of sacrificial spin-on glass (SOG) etching in non-straight microchannels using hydrofluoric acid

• Main Authors: Hamzah, A.A., Majlis, B.Y., Ahmad, I.
• 出版: 2017
• 在线阅读: http://dspace.uniten.edu.my:8080/jspui/handle/123456789/5318

This paper studies spin-on glass (SOG) etching in T-shaped microchannels using hydrofluoric acid (HF). An etching model based on non-first order chemical reaction/steady-state diffusion sacrificial layer etching mechanism is presented to compensate for the etching effect at channel junction. Microch...