Modelling of sacrificial spin-on glass (SOG) etching in non-straight microchannels using hydrofluoric acid
This paper studies spin-on glass (SOG) etching in T-shaped microchannels using hydrofluoric acid (HF). An etching model based on non-first order chemical reaction/steady-state diffusion sacrificial layer etching mechanism is presented to compensate for the etching effect at channel junction. Microch...
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| 主要な著者: | , , |
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2017
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| オンライン･アクセス: | http://dspace.uniten.edu.my:8080/jspui/handle/123456789/5318 |
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